Electronic Materials Problems

This subset of the transport problems archive includes those problems with keyword "Electronic materials":

1. Chemical vapor deposition, by Adam Powell (solution, source directory, metadata), last modified September 26, 2004.
2. Chemical vapor deposition of titanium dioxide, by Byron Hsu, Wang Lei, Forrest Liau, David Lin and Teresa Wang (solution, source, solution source, metadata), last modified February 22, 2007.
3. Chemical vapor deposition reactor design, by Adam Powell (solution, source directory, metadata), last modified December 9, 2004.
4. Czochralski crystal growth, by Adam Powell (solution, source directory, metadata), last modified October 28 2004.
5. Drive-in diffusion of semiconductor dopant, by Adam Powell (solution, source directory, metadata), last modified September 26, 2004.
6. Growth of a TiSi intermetallic layer, by Adam Powell (solution, source directory, metadata), last modified September 28, 2004.
7. Molecular beam epitaxy deposition rate, by Adam Powell (solution, source directory, metadata), last modified February 6, 2005.
8. Radiation in facing target sputtering, by Adam Powell (solution, source directory, metadata), last modified October 14, 2004.
9. Thermal properties and optimal materials selection, by Adam Powell (solution, source, solution source, metadata), last modified June 17, 2004.

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